Practical Aerosol Deposition & Applications of High-k Thin Film

High-k BaTiO Film Deposition Method

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Bibliografische Daten
ISBN/EAN: 9783330042643
Sprache: Englisch
Umfang: 260 S.
Format (T/L/B): 1.6 x 22 x 15 cm
Auflage: 1. Auflage 2017
Einband: kartoniertes Buch

Beschreibung

This book provides a low-temperature deposition method of ceramic-based high-k functional thick/thin films employing room-temperature aerosol deposition (AD) process. Its possible to deposit high density and quality ceramic films from initial nano-particles without any high-temperature process on almost any kinds of substrate. The AD process takes an advantage of the room-temperature deposition phenomenon for the embedded capacitor technology that is based on three-dimensional integration of passive components with the low-melting point materials such as metals and plastics. Consequently, in order to realize the embedded capacitor technologies using the AD process, several investigations for high capacitance density, dielectric strength, and tolerance were introduced in this book.

Autorenportrait

Prof. Nam-Young Kim was born in Seoul, Korea in 1960. He received two Masters and two Ph.D. degrees from State University of New York (SUNY) at Buffalo and Midwest University, U.S.A.; the M.S. and the Ph.D. in Electronic Engineering, SUNY at Buffalo in 1991 and 1994. He also received M. Div. and D. Div. in Midwest University in 2004 and 2006.